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Heating of condensation surface during magnetron sputtering

Author

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  • L. R. Shaginyan
  • V. R. Shaginyan
  • J. G. Han

Abstract

Chromium films deposited by magnetron sputtering on non-heated substrates from non-thermalized atoms crystallize in regular bcc Cr phase, with non-uniform microstructure and lattice constant along the thickness. These non-uniformities decrease with elevation of the substrate temperature and vanish at a certain value. However films deposited on non-heated substrates from thermalized atoms crystallize in a low-temperature Cr phase and have almost uniform microstructure. We have developed a model explaining this effect, which is based on the supposition of the formation of a “hot” layer on the growth surface during deposition, whose temperature depends on the flux of energy delivered to the condensation surface and can be noticeably higher than the substrate temperature. Detailed investigation of the structure of Cr films deposited at various temperatures and energy fluxes delivered to the growth surface, correlate well with the above model. Copyright EDP Sciences/Società Italiana di Fisica/Springer-Verlag 2005

Suggested Citation

  • L. R. Shaginyan & V. R. Shaginyan & J. G. Han, 2005. "Heating of condensation surface during magnetron sputtering," The European Physical Journal B: Condensed Matter and Complex Systems, Springer;EDP Sciences, vol. 46(3), pages 335-342, August.
    • Handle: RePEc:spr:eurphb:v:46:y:2005:i:3:p:335-342
    DOI: 10.1140/epjb/e2005-00258-4
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