Author
Listed:
- Dietmar Korn
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT))
- Matthias Lauermann
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT))
- Sebastian Koeber
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT)
Institute of Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT))
- Patrick Appel
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT))
- Luca Alloatti
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT))
- Robert Palmer
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT))
- Pieter Dumon
(IMEC)
- Wolfgang Freude
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT)
Institute of Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT))
- Juerg Leuthold
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT)
Institute of Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT)
Present address: Laboratory for Electromagnetic Fields and Microwave Electronics (IFH), Swiss Federal Institute of Technology (ETH), Zürich 8092, Switzerland.)
- Christian Koos
(Institute of Photonics and Quantum Electronics (IPQ), Karlsruhe Institute of Technology (KIT)
Institute of Microstructure Technology (IMT), Karlsruhe Institute of Technology (KIT))
Abstract
Silicon photonics enables large-scale photonic–electronic integration by leveraging highly developed fabrication processes from the microelectronics industry. However, while a rich portfolio of devices has already been demonstrated on the silicon platform, on-chip light sources still remain a key challenge since the indirect bandgap of the material inhibits efficient photon emission and thus impedes lasing. Here we demonstrate a class of infrared lasers that can be fabricated on the silicon-on-insulator (SOI) integration platform. The lasers are based on the silicon–organic hybrid (SOH) integration concept and combine nanophotonic SOI waveguides with dye-doped organic cladding materials that provide optical gain. We demonstrate pulsed room-temperature lasing with on-chip peak output powers of up to 1.1 W at a wavelength of 1,310 nm. The SOH approach enables efficient mass-production of silicon photonic light sources emitting in the near infrared and offers the possibility of tuning the emission wavelength over a wide range by proper choice of dye materials and resonator geometry.
Suggested Citation
Dietmar Korn & Matthias Lauermann & Sebastian Koeber & Patrick Appel & Luca Alloatti & Robert Palmer & Pieter Dumon & Wolfgang Freude & Juerg Leuthold & Christian Koos, 2016.
"Lasing in silicon–organic hybrid waveguides,"
Nature Communications, Nature, vol. 7(1), pages 1-9, April.
Handle:
RePEc:nat:natcom:v:7:y:2016:i:1:d:10.1038_ncomms10864
DOI: 10.1038/ncomms10864
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