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Adaptive Step-Size Control in Simulation of Diffusive CVD Processes

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  • Jürgen Geiser
  • Christian Fleck

Abstract

We present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates. In the models, we discuss the application of different models to simulate the plasma-transport of chemical reactants in the gas-chamber. The contribution are an optimal control problem based on a PID control to obtain a homogeneous layering. We have taken into account one- and two-dimensional problems that are given with constraints and control functions. A finite-element formulation with adaptive feedback control for time-step selection has been developed for the diffusion process. The optimization is presented with efficient algorithms. Numerical experiments are discussed with respect to the diffusion processes of the macroscopic model.

Suggested Citation

  • Jürgen Geiser & Christian Fleck, 2009. "Adaptive Step-Size Control in Simulation of Diffusive CVD Processes," Mathematical Problems in Engineering, Hindawi, vol. 2009, pages 1-34, May.
    • Handle: RePEc:hin:jnlmpe:728105
    DOI: 10.1155/2009/728105
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