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Formation of 7-nm-wide Line&Spaces in Half Pitch by 3 Dimensional Self-assembly of Nano-dots Using Sphere Type PS-PDMS

Author

Listed:
  • Sumio Hosaka
  • Hui Zhang
  • You Yin
  • Hayato Sone

Abstract

We have formed nanometer-wide lines & spaces by graphoepitaxy of sphere type polystyrene-poly dimethyl siloxane (PS-PDMS), with a molecular weight (MW) of 14.6 kg/mol., along electron-beam (EB)-drawn resist guide lines. We have 3-dimensionally ordered the sphere type PS-PDMS by controlling a thickness of the PS-PDMS along improved guide lines to form the line and space pattern. We obtained the thickness dependence on the pattern change such as nano-dot arrays and nano-line & space patterns. When the thickness increased to about +4 nm from the upper thickness for formation of the dot arrays, the line & space patterns have been formed with about 7 nm in line width and 14 nm in pitch.

Suggested Citation

  • Sumio Hosaka & Hui Zhang & You Yin & Hayato Sone, 2021. "Formation of 7-nm-wide Line&Spaces in Half Pitch by 3 Dimensional Self-assembly of Nano-dots Using Sphere Type PS-PDMS," European Journal of Applied Physics, European Open Science, vol. 3(6), pages 84-90, November.
    • Handle: RePEc:epw:physic:v:3:y:2021:i:6:id:11141
    DOI: 10.24018/ejphysics.2021.3.6.141
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    1. Sang Ouk Kim & Harun H. Solak & Mark P. Stoykovich & Nicola J. Ferrier & Juan J. de Pablo & Paul F. Nealey, 2003. "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates," Nature, Nature, vol. 424(6947), pages 411-414, July.
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