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Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization

Author

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  • Óscar. R. González-López

    (Business Organization and Sociology Department, School of Economics and Business Administration, University of Extremadura, 06006 Badajoz, Spain)

  • María Buenadicha-Mateos

    (Business Organization and Sociology Department, School of Economics and Business Administration, University of Extremadura, 06006 Badajoz, Spain)

  • M. Isabel Sánchez-Hernández

    (Business Organization and Sociology Department, School of Economics and Business Administration, University of Extremadura, 06006 Badajoz, Spain)

Abstract

This paper explores technostress and its dimensions, assessing the relationship with possible negative effects in the individual, social and professional sphere. The study uses a self-reported approach of undergraduate students in Spain ( n = 337), forced to follow their academic life by using technology comprehensively because of social distancing, as a public health action necessary to reduce the spread of COVID-19. The analysis, based on the exploration of a system of archetypes of the use of social networks, presents insights into contemporary technostress management as a new approach that can suppose opportunities for the optimization of prevention plans. Pearson’s correlation coefficients and structural equation modeling based on partial least squares (SEM-PLS) were the methods used for achieving the goals. The results reveal valid and reliable measures where technostress has a high impact on the individual sphere of students and there is a significant relationship between the type of user and techno-anxiety. The conclusions point to the imperative for developing a deeper understanding of technostress by archetypes, in both a higher education context (as antecedent) and the world of work, in an irreversible move towards a digital economy.

Suggested Citation

  • Óscar. R. González-López & María Buenadicha-Mateos & M. Isabel Sánchez-Hernández, 2021. "Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization," IJERPH, MDPI, vol. 18(8), pages 1-20, April.
    • Handle: RePEc:gam:jijerp:v:18:y:2021:i:8:p:4216-:d:537162
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    2. Alejandro Vega-Muñoz & Carla Estrada-Muñoz & Paola Andreucci-Annunziata & Nicolas Contreras-Barraza & Heidi Bilbao-Cotal, 2022. "Validation of a Measurement Scale on Technostress for University Students in Chile," IJERPH, MDPI, vol. 19(21), pages 1-14, November.
    3. Gabriele Giorgi & Antonio Ariza-Montes & Nicola Mucci & Antonio L. Leal-Rodríguez, 2022. "The Dark Side and the Light Side of Technology-Related Stress and Stress Related to Workplace Innovations: From Artificial Intelligence to Business Transformations," IJERPH, MDPI, vol. 19(3), pages 1-5, January.

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