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Who uses deceptive impression management to succeed at job interviews? The role of ethical ideologies and work locus of control

Author

Listed:
  • Uday Bhaskar
  • Bijaya Mishra
  • Nidhi Yadav
  • Paresha Sinha

Abstract

Purpose - Drawing upon theories of ethical ideologies (idealism and relativism) and work locus of control, this study aims to examine how ethical ideology in job seekers influences their use of deceptive impression management (deceptive IM) behavior during job interviews. Design/methodology/approach - A time-lagged study was conducted with two measurement waves to test our hypotheses. AMOS-SEM, which included bootstrapping (5,000 re-sampling) procedures to analyze the data, was used. Findings - Results indicate that a job seeker's relativistic ethical ideology influences their use of deceptive IM behavior during job interviews and work locus of control – internal [WLOC (internal)] mediates this relationship. Exploring the relationship between ethical ideologies of job seekers and their deceptive IM behavior at job interviews, this study found that relativistic individuals with WLOC (internal) were more inclined to engage in deceptive IM. Originality/value - To the best of the authors’ knowledge, this is one of the first studies to explore the role of ethical ideology in influencing deception IM behavior during job interviews. Knowledge of the relationship between job seekers ethical ideologies and deception IM behavior at job interviews would alert HR managers to adopt additional screening processes to detect candidates who indulge in deceptive IM behavior to exaggerate their image to influence the interviewer's perception.

Suggested Citation

  • Uday Bhaskar & Bijaya Mishra & Nidhi Yadav & Paresha Sinha, 2022. "Who uses deceptive impression management to succeed at job interviews? The role of ethical ideologies and work locus of control," International Journal of Manpower, Emerald Group Publishing Limited, vol. 44(3), pages 453-469, September.
  • Handle: RePEc:eme:ijmpps:ijm-08-2021-0503
    DOI: 10.1108/IJM-08-2021-0503
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