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Investigating stress and strain due to operational information systems

Author

Listed:
  • Anuragini Shirish

    (LITEM - Laboratoire en Innovation, Technologies, Economie et Management (EA 7363) - UEVE - Université d'Évry-Val-d'Essonne - TEM - Télécom Ecole de Management, IMT-BS - DSI - Département Systèmes d'Information - TEM - Télécom Ecole de Management - IMT - Institut Mines-Télécom [Paris] - IMT-BS - Institut Mines-Télécom Business School - IMT - Institut Mines-Télécom [Paris])

  • Shalini Chandra

    (SPJ - S P Jain School of Global Management (.))

  • Shirish C. Srivastava

    (HEC Paris - Recherche - Hors Laboratoire - HEC Paris - Ecole des Hautes Etudes Commerciales)

Abstract

Despite the wealth of research examining the influence of technostress on job outcomes, the mechanisms through which technostress generates strain to impact job outcomes is not clear. Grounding our arguments in the theory of threat bias, we investigate the mechanisms explaining this important relationship and delineate useful implications.

Suggested Citation

  • Anuragini Shirish & Shalini Chandra & Shirish C. Srivastava, 2017. "Investigating stress and strain due to operational information systems," Post-Print hal-02374108, HAL.
  • Handle: RePEc:hal:journl:hal-02374108
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    Keywords

    Organizational technologies; Technostress;

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