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Surface Characterization And Grain Size Calculation Of Silver Films Deposited By Thermal Evaporation

Author

Listed:
  • MUHAMMAD MAQBOOL

    (Department of Science and Mathematics, Mount Olive College, 634 Henderson Street, Mount Olive, NC 28365, USA)

  • TAHIRZEB KHAN

    (Department of Physics, University of Massachusetts Boston, 100 Morrissey, Boulevard, Boston, MA 02125, USA)

Abstract

Thin films of pure silver were deposited on glass substrate by thermal evaporation process at room temperature. Surface characterization of the films was performed using X-ray diffraction (XRD) and Atomic Force Microscopy (AFM). Thickness of the films varied between 20 nm and 60 nm. XRD analysis provided a sharp peak at 38.75° from silver. These results indicated that the films deposited on glass substrates at room temperature are crystalline. 3D and top view pictures of the films were obtained by AFM to study the grain size and its dependency on various factors. Grain sizes were calculated using the XRD results and Scherer's formula. Average grain size increased with the thickness of the deposited films. A minimum grain size of 8 nm was obtained for 20 nm thick films, reaching a maximum value of 41.9 nm when the film size reaches 60 nm. We could not find any sequential variation in the grain size with the growth rate.

Suggested Citation

  • Muhammad Maqbool & Tahirzeb Khan, 2005. "Surface Characterization And Grain Size Calculation Of Silver Films Deposited By Thermal Evaporation," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 12(05n06), pages 759-766.
    • Handle: RePEc:wsi:srlxxx:v:12:y:2005:i:05n06:n:s0218625x05007621
    DOI: 10.1142/S0218625X05007621
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