Author
Listed:
- N. MIYATA
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
- T. IMAZONO
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
- S. ISHIKAWA
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
- A. ARAI
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
- M. YANAGIHARA
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
- M. WATANABE
(Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan)
Abstract
We measured SiL2,3soft-X-ray emission spectra from Mo/Si multilayers annealed at 400°C. We showed thatMoSi2was formed at the interface, and the thickness of theMoSi2interlayer increased with the annealing time. By an analysis of the soft-X-ray emission spectra and the patterns of small-angle X-ray diffraction, we estimated the thickness of theMoSi2interlayer and a diffusion coefficient between Mo and Si at 400°C as1.1 (± 0.2) × 10-18cm2/s. We showed that soft-X-ray emission spectroscopy is a useful tool for studying the thermal change of the buried interface nondestructively.
Suggested Citation
N. Miyata & T. Imazono & S. Ishikawa & A. Arai & M. Yanagihara & M. Watanabe, 2002.
"BURIED INTERFACES OF HEAT-LOADED Mo/SiMULTILAYERS STUDIED BY SOFT-X-RAY EMISSION SPECTROSCOPY,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 9(02), pages 663-667.
Handle:
RePEc:wsi:srlxxx:v:09:y:2002:i:02:n:s0218625x0200283x
DOI: 10.1142/S0218625X0200283X
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