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Cu(111)SURFACE RELAXATION BY VLEED

Author

Listed:
  • I. BARTOŠ

    (Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic)

  • P. JAROŠ

    (Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic)

  • A. BARBIERI

    (Materials Sciences Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720, USA)

  • M.A. VAN HOVE

    (Materials Sciences Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720, USA)

  • W.F. CHUNG

    (Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong)

  • Q. CAI

    (Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong)

  • M.S. ALTMAN

    (Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong)

Abstract

Very-low-energy electron diffraction (VLEED) intensities from a cleanCu(111)surface have been measured in detail in the energy range 15–100 eV by low-energy electron microscope (LEEM). This enabled the elimination of possible disturbances due to stray magnetic fields. Corresponding theoreticalI–Vcurves have been obtained in good agreement with experimental data when an image-type surface barrier and anisotropy of the electron attenuation were taken into account. The reliability factor analysis indicates a slight expansion of the topmost interatomic spacing ofCu(111)relative to its bulk value.

Suggested Citation

  • I. Bartoš & P. Jaroš & A. Barbieri & M.A. Van Hove & W.F. Chung & Q. Cai & M.S. Altman, 1995. "Cu(111)SURFACE RELAXATION BY VLEED," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 2(04), pages 477-482.
    • Handle: RePEc:wsi:srlxxx:v:02:y:1995:i:04:n:s0218625x95000431
    DOI: 10.1142/S0218625X95000431
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