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Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Author

Listed:
  • Yurun Miao

    (Johns Hopkins University)

  • Dennis T. Lee

    (Johns Hopkins University)

  • Matheus Dorneles Mello

    (Brookhaven National Laboratory
    University of Delaware)

  • Mueed Ahmad

    (Brookhaven National Laboratory
    Stony Brook University)

  • Mohammed K. Abdel-Rahman

    (Johns Hopkins University)

  • Patrick M. Eckhert

    (Johns Hopkins University)

  • J. Anibal Boscoboinik

    (Brookhaven National Laboratory
    Stony Brook University)

  • D. Howard Fairbrother

    (Johns Hopkins University)

  • Michael Tsapatsis

    (Johns Hopkins University
    Johns Hopkins University)

Abstract

Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

Suggested Citation

  • Yurun Miao & Dennis T. Lee & Matheus Dorneles Mello & Mueed Ahmad & Mohammed K. Abdel-Rahman & Patrick M. Eckhert & J. Anibal Boscoboinik & D. Howard Fairbrother & Michael Tsapatsis, 2022. "Solvent-free bottom-up patterning of zeolitic imidazolate frameworks," Nature Communications, Nature, vol. 13(1), pages 1-8, December.
    • Handle: RePEc:nat:natcom:v:13:y:2022:i:1:d:10.1038_s41467-022-28050-z
    DOI: 10.1038/s41467-022-28050-z
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    Cited by:

    1. Xiaoli Tian & Fu Li & Zhenyuan Tang & Song Wang & Kangkang Weng & Dan Liu & Shaoyong Lu & Wangyu Liu & Zhong Fu & Wenjun Li & Hengwei Qiu & Min Tu & Hao Zhang & Jinghong Li, 2024. "Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography," Nature Communications, Nature, vol. 15(1), pages 1-15, December.
    2. Youyou Lu & Xuan Zhang & Liyan Zhao & Hong Liu & Mi Yan & Xiaochen Zhang & Kenji Mochizuki & Shikuan Yang, 2023. "Metal-organic framework template-guided electrochemical lithography on substrates for SERS sensing applications," Nature Communications, Nature, vol. 14(1), pages 1-12, December.

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