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Design of a Chamfered Structure on Consequent-Pole Vernier Permanent-Magnet Machine

Author

Listed:
  • Jien Ma

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

  • Bowen Xu

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

  • Qiyi Wu

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

  • Chao Luo

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

  • Qiu Lin

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

  • Youtong Fang

    (College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China)

Abstract

The consequent-pole (CP) Vernier permanent-magnet (VPM) machine has been developed over the last decade. In VPM machine, the CP structure can produce considerable torque with a half volumn of the PMs compared with the regular structure, so the cost is reduced and the mechanical strength is increased. In this paper, an improvement of chamfering structure on a CPVPM machine is proposed to alleviate the flux leakage and increase the torque density. The chamfered structure is easily machined and will not influence the robustness of the rotor. The comparison results show that under the same volume and copper loss constraint, the proposed structure has smaller cogging torque, smaller torque ripple, larger torque density and larger power factor.

Suggested Citation

  • Jien Ma & Bowen Xu & Qiyi Wu & Chao Luo & Qiu Lin & Youtong Fang, 2022. "Design of a Chamfered Structure on Consequent-Pole Vernier Permanent-Magnet Machine," Energies, MDPI, vol. 15(20), pages 1-9, October.
    • Handle: RePEc:gam:jeners:v:15:y:2022:i:20:p:7780-:d:948693
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