Competitive deposition–evaporation growth models

We study two models for competitive deposition and evaporation of particles from rough surfaces. The process of deposition is carried out for two models, one according to the ballistic deposition (BD) and the other according to the random deposition with a surface relaxation (RDSR). The process of evaporation is the same for both models, where it obeys the random evaporation model (RE). The probability of the deposition and evaporation is 1−p and p, respectively. We show that the scaling behaviour of the standard BD and RDSR models are independent of particle evaporation. Particle evaporation only causes a delay for the scaling behaviour of the models. This delay is independent of the surface size for all typical probabilities and depends only on the value of p. We obtain two power law relations in terms of p for the BD/RE model. One of these relations is derived from the ratio of the crossover times, which is the ratio of the time of surface saturation to the transient time from RD to BD (t2/t1), and the other relation comes from the ratio of the surface roughness (W2) observed in time t2 to the surface roughness (W1) in time t1. By rescaling the data corresponding to the BD/RE model, a fine agreement with the relation introduced by Chou et al. is experienced.