XIALI LI () (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China; Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China) GUANGQIAN YANG (Institute to Applied Chemistry, Shanghai Normal University, Shanghai 200234, P. R. China) JIAN CHEN (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China) RONGJUN ZHANG (School of Information Science and Engineering, Fudan University, Shanghai 200433, P. R. China) WEIMIN ZHOU (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China) YANBO LIU (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China) JING ZHANG (Shanghai Nanotechnology Promotion Center, Shanghai 200237, P. R. China) QINGKANG WANG (Research Institute of Micro/Nano-Science and Technology, Shanghai Jiaotong University, Shanghai 200300, P. R. China)
Abstract
A significant enhancement in light extraction from colloidal ZnO QD films was observed on an addition of a layer of two-dimensional photonic crystal (2D-PC) structure. The PCs with a rectangular-lattice air-hole array pattern with the period of 1.4 μm and the hole-size of 400 nm were fabricated by UV-nanoimprint lithography (UV-NIL). Unlike the commonly utilized electron-beam lithographic technique, the UV-NIL process can make patterns over a large area with high throughput. The resultant colloidal zinc oxide (ZnO) QD films with a PC pattern add-on had nearly double the output power, as measured from the top of the film.
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Article provided by World Scientific Publishing Co. Pte. Ltd. in its journal Surface Review and Letters.
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