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Annealing Temperature Effect On The Field Emission Properties Of Carbon Nanotube Films

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Author Info

  • T. CHEN

    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

  • Z. SUN

    ()
    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

  • L. L. WANG

    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

  • Y. W. CHEN

    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

  • P. S. GUO

    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

  • W. X. QUE

    (Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University, North Zhongshan Rd. 3663, Shanghai 200062, China)

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    Abstract

    As the carbon nanotubes (CNTs) films are applied to the field emission cathodes in the vacuum devices, heat treatment in the range of 400°C–500°C is often conducted during the device sealing process, especially for glass-based devices. The annealing temperature effect on the field emission of the CNT films prepared by chemical vapor deposition is investigated. The CNT film annealed at 400°C in air contains less amorphous carbon phase, and shows better field emission properties comparing to the as-grown CNT film. Annealing at 450°C causes serious oxidative damage along the tube walls, resulting in the poor field emission performance. The CNTs annealed at 500°C are all burned out. The experiment shows that the sealing temperature at 400°C or below can be conducted in air, while the sealing temperature above 400°C should be done in N2 or Ar ambient.

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    Bibliographic Info

    Article provided by World Scientific Publishing Co. Pte. Ltd. in its journal Surface Review and Letters.

    Volume (Year): 14 (2007)
    Issue (Month): 05 ()
    Pages: 969-972

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    Handle: RePEc:wsi:srlxxx:v:14:y:2007:i:05:p:969-972

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