Thin film silicon photovoltaics: Architectural perspectives and technological issues
AbstractThin film photovoltaics is a particularly attractive technology for building integration. In this paper, we present our analysis on architectural issues and technological developments of thin film silicon photovoltaics. In particular, we focus on our activities related to transparent and conductive oxide (TCO) and thin film amorphous and microcrystalline silicon solar cells. The research on TCO films is mainly dedicated to large-area deposition of zinc oxide (ZnO) by low pressure-metallorganic chemical vapor deposition. ZnO material, with a low sheet resistance ( 82%) in the whole wavelength range of photovoltaic interest, has been obtained. "Micromorph" tandem devices, consisting of an amorphous silicon top cell and a microcrystalline silicon bottom cell, are fabricated by using the very high frequency plasma enhanced chemical vapor deposition technique. An initial efficiency of 11.1% (>10% stabilized) has been obtained.
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Bibliographic InfoArticle provided by Elsevier in its journal Applied Energy.
Volume (Year): 86 (2009)
Issue (Month): 10 (October)
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Web page: http://www.elsevier.com/wps/find/journaldescription.cws_home/405891/description#description
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- Liu, Yong & Wang, Hai & Shen, Hui & Chen, Wei, 2010. "The 3-dimensional dye-sensitized solar cell and module based on all titanium substrates," Applied Energy, Elsevier, vol. 87(2), pages 436-441, February.
- Han, Jun & Lu, Lin & Yang, Hongxing, 2010. "Numerical evaluation of the mixed convective heat transfer in a double-pane window integrated with see-through a-Si PV cells with low-e coatings," Applied Energy, Elsevier, vol. 87(11), pages 3431-3437, November.
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